Phase-Shifting Technology for ULSI Patterning

Tsuneo TERASAWA  Shinji OKAZAKI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E76-C   No.1   pp.19-25
Publication Date: 1993/01/25
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
optical lithography,  ultralarge scale integration devices,  phase shift mask,  resolution,  depth of focus,  stepper,  

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Summary: 
Fabrication of 0.2 to 0.3 µm features is vital for future ultralarge scale integration devices. An area of particular concern is whether optical lithography can delineate such feature sizes, i.e., less than the exposure wavelength. The use of a phase shift mask is one of the most effective means of improving resolution in optical lithography. This technology basically makes use of the interference between light transmitting through adjacent apertures of the mask. Various types of phase shift masks and their imaging characteristics are discussed and compared with conventional normal transmission masks. To apply these masks effectively to practical patterns, a phase shifter pattern design tool and mask repair method must be established. The phase shifting technology offers a potential to fabricate 0.3 µm features by using the current i-line stepper, and 0.2 µm features by using excimer laser stepper.