Real-Time Feed-Forward Control LSIs for a Direct Wafer Exposure Electron Beam System

Atsushi IWATA
Tsutomu HOSAKA

IEICE TRANSACTIONS on Electronics   Vol.E76-C    No.1    pp.124-135
Publication Date: 1993/01/25
Online ISSN: 
Print ISSN: 0916-8516
Type of Manuscript: PAPER
Category: Integrated Electronics
asic,  pipeline,  adaptive,  electron beam,  

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Three custom LSIs for EB60, a direct wafer exposure electron beam system, have been developed using 0.8 µm BiCMOS and SST bipolar technologies. The three LSIs are i) a shot cycle control LSI for controlling each exposure cycle time, ii) a linear matrix computation LSI for coordinate modification of the exposure pattern data, and iii) a position calculation LSI for determining the precise position of the wafer. These LSIs allow the deflection corrector block of the revised EB60 to be realized on a single board. A new adaptive pipeline control technique which optimizes each shot period according to the exposure data is implemented in the shot-cycle control LSI. The position calculation LSI implements a new, highly effective 2-level pipeline exposure technique, the levels refer to major-field-deflection and minor-field-deflection. The linear-matrix computation LSI is designed not only for the EB60 but also for a wide variety of parallel digital processing applications.