Leakage Current Reduction in Surrounding Hi-Capacitor DRAM Cell

Geshu FUSE  Ichirou NAKAO  Yohei ICHIKAWA  Chiaki KUDO  Toshiki YABU  Akito UNO  Kazuyuki SAWADA  Yasushi NAITO  Michihiro INOUE  Hiroshi IWASAKI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E74-C    No.4    pp.812-817
Publication Date: 1991/04/25
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Issue on LSI Memories)
Category: DRAM
Keyword: 


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Summary: 
Leakage current in SCC DRAM was reduced by optimizing implant conditions to form channel stopper, node connection and Hi-C boron. To reduce leakage current, the implantation doses should be reduced to reduce implant induced damages. These implant dose reductions are compromised to the necessities of high p type concentration to prevent punch-throughs at several parts of the cell. Near the deep trench bottom, damaged region due to Hi-C boron implant is separated from the bottom edge of the n+ storage node to suppress the gate controlled leakage current. By the improvements, the retention time of the 16 M SCC DRAM becomes over 30 sec at room temperature. It is also shown that folded bit line structure could be adopted easily for SCC.