A Study on the Oxidation State of Bi-layered Anodized Films

Tsuyoshi DOBASHI  Toshiji UMEZAWA  Katsutaka SASAKI  Atsushi NOYA  

IEICE TRANSACTIONS on Electronics   Vol.E74-C   No.10   pp.3357-3359
Publication Date: 1991/10/25
Online ISSN: 
Print ISSN: 0916-8516
Type of Manuscript: LETTER
Category: Materials

Full Text: PDF(184.3KB)>>
Buy this Article

We have studied the oxidation state of Al/Hf and Ta/Hf bi-layered films by AES/XPS analysis. The anion transport process through the upper oxidized layer which is oxygen supply medium for Hf oxidation is examined. It is found that the oxidation reaction of Hf occurring with sufficient anion transport through the upper oxidized layer corresponds to the excellent properties as capacitors.