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A Study on the Oxidation State of Bi-layered Anodized Films
Tsuyoshi DOBASHI Toshiji UMEZAWA Katsutaka SASAKI Atsushi NOYA
IEICE TRANSACTIONS on Electronics
Publication Date: 1991/10/25
Print ISSN: 0916-8516
Type of Manuscript: LETTER
Full Text: PDF(184.3KB)>>
We have studied the oxidation state of Al/Hf and Ta/Hf bi-layered films by AES/XPS analysis. The anion transport process through the upper oxidized layer which is oxygen supply medium for Hf oxidation is examined. It is found that the oxidation reaction of Hf occurring with sufficient anion transport through the upper oxidized layer corresponds to the excellent properties as capacitors.