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An Analysis of Substrate Current in Memory Cell for ULSI SRAM
Yoshiyuki HARAGUCHI Shuji MURAKAMI Yasumasa NISHIMURA Kenji ANAMI
Publication
IEICE TRANSACTIONS (1976-1990)
Vol.E73
No.11
pp.1861-1862 Publication Date: 1990/11/25 Online ISSN:
DOI: Print ISSN: 0000-0000 Type of Manuscript: Special Section LETTER (Special Issue on 1990 Autumn Natl. Conv. IEICE) Category: Integrated Circuits Keyword:
Full Text: PDF>>
Summary:
We analyze the substrate corrent of submicron transistors in the memory cell of ULSI SRAMs in the cases of PMOS and NMOS bit line loads. The lifetime of the transistors is also estimated. The SRAM using an NMOS bit load is found to be better as a hot carrier than that with a PMOS bit load.
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