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An Auger Electron Spectroscopy Study on the Anodization Process of High-Quality Thin-Film Capacitors Made of Hafnium
Atsushi NOYA Katsutaka SASAKI Toshiji UMEZAWA
IEICE TRANSACTIONS (1976-1990)
Publication Date: 1989/12/25
Print ISSN: 0000-0000
Type of Manuscript: PAPER
Full Text: PDF(548.5KB)>>
Formation process of the anodic oxide film of hafnium for use as a thin-film capacitor has been examined by the current-voltage characteristics of the anodization and the in-depth analysis of formed oxide using Auger electron spectroscopy. It is found that the oxide growth obeys three different rate laws such as the linear rate law at first and next the parabolic rate law during the constant current anodization, and then the reciprocal logarithmic rate law during the constant voltage anodization following after the constant current process. From the Auger electron spectroscopy analysis, it is found that the shape of the compositional depth profile of the grown oxide film varies associating with the rate law of oxidation obeyed. The variation of depth profile correlating with the rate law is discussed with respect to each elementary process such as the transport and/or the reaction of chemical species interpreted from the over-all behavior of anodization process. It is revealed that the stoichiometric film having an interface with sharp transition, which is favorable for obtaining excellent electrical properties of the capacitor, can be obtained under the condition that the phase-boundary reaction is the rate-determining step of the anodization. The constant voltage anodization process also satisfies such circumstances and therefore can be the favorable method for preparing highquality thin-film capacitors.