TRIMEDES: A Triangular Mesh Device Simulator Linked with Topography/Process Simulation

Naoyuki SHIGYO  Koichi SATO  Koichi KATO  Tetsunori WADA  

IEICE TRANSACTIONS (1976-1990)   Vol.E71   No.10   pp.992-999
Publication Date: 1988/10/25
Online ISSN: 
Print ISSN: 0000-0000
Type of Manuscript: PAPER
Category: Semiconductors; Materials and Devices

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This paper describes a newly developed triangular mesh device simulator, TRIMEDES. TRIMEDES is merged into a supervised simulation system which covers the range from pattern layout to topography/process simulation and also to device simulation. TRIMEDES features an automatic triangular mesh generation capability, and a liking method between a topography/process simulator and a device simulator. The procedure employed in the triangular mesh generation involves the following techniques; (1) primary mesh generation, (2) feedback rate method in order to achieve smooth element size variation, and (3) relaxation technique after mesh generation to suppress obtuse triangles. This procedure proves to be effective and robust in the mesh generation for nonplanar device structures. In order to link the device simulator TRIMEDES to the topograhpy/process simulator, the device shape is represented as closed-loop string topography data and a triangular mesh is generated based on the string data. The pre-processor of the mesh generator has been developed, which rearranges the string data to cope with the mesh generation. The geometrical shape of a device can be reflected in the device simulation, since the string shape data of the topography/process simulation are smoothly transferred to the device simulator.