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Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface
Terutaka TAMAI Mitsuo KOMINAMI
IEICE TRANSACTIONS (1976-1990)
Publication Date: 1987/04/25
Print ISSN: 0000-0000
Type of Manuscript: Special Section LETTER (Special Issue: Papers from 1987 National Convention IEICE)
Category: Components and Materials
Full Text: PDF>>
By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.