Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface

Terutaka TAMAI  Mitsuo KOMINAMI  

IEICE TRANSACTIONS (1976-1990)   Vol.E70   No.4   pp.343-345
Publication Date: 1987/04/25
Online ISSN: 
Print ISSN: 0000-0000
Type of Manuscript: Special Section LETTER (Special Issue: Papers from 1987 National Convention IEICE)
Category: Components and Materials

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By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.