Ferroelectric Gate Field-Effect Transistors with 10nm Thick Nondoped HfO2 Utilizing Pt Gate Electrodes

Min Gee KIM  Masakazu KATAOKA  Rengie Mark D. MAILIG  Shun-ichiro OHMI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E103-C   No.6   pp.280-285
Publication Date: 2020/06/01
Online ISSN: 1745-1353
DOI: 10.1587/transele.2019FUP0005
Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Electronic Materials
Keyword: 
ferroelectrics,  nondoped HfO2,  MFSFET,  nonvolatile memory,  

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Summary: 
Ferroelectric gate field-effect transistors (MFSFETs) were investigated utilizing nondoped HfO2 deposited by RF magnetron sputtering utilizing Hf target. After the post-metallization annealing (PMA) process with Pt top gate at 500°C/30s, ferroelectric characteristic of 10nm thick nondoped HfO2 was obtained. The fabricated MFSFETs showed the memory window of 1.7V when the voltage sweep range was from -3 to 3V.