| Keyword : sputtering
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Characterization of AlON Thin Films Formed by ECR Plasma Oxidation of AlN/Si(100) Shun-ichiro OHMI Go YAMANAKA Tetsushi SAKAI | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2004/01/01
Vol. E87-C
No. 1 ;
pp. 24-29
Type of Manuscript:
Special Section PAPER (Special Section on High-κ Gate Dielectrics)
Category: Keyword: high-κ, AlON, ECR, sputtering, oxidation, | | Summary | Full Text:PDF(1.3MB) | |
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