Keyword : sheet resistance


Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray Irradiation
Akira HEYA Naoto MATSUO Kazuhiro KANDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2016/04/01
Vol. E99-C  No. 4 ; pp. 474-480
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
boron dopantlow-temperature activationsoft X-ray irradiationsheet resistanceelectron excitationdepth profile
 Summary | Full Text:PDF(805.2KB)

A Test Structure to Analyze Highly-Doped-Drain and Lightly-Doped-Drain in CMOSFET
Takashi OHZONE Kazuhiko OKADA Takayuki MORISHITA Kiyotaka KOMOKU Toshihiro MATSUDA Hideyuki IWATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2006/09/01
Vol. E89-C  No. 9 ; pp. 1351-1357
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
CMOSFETLDD-typesource/drain-resistancesheet resistance
 Summary | Full Text:PDF(997KB)

Ultra-Shallow Junction Formation with Antimony Implantation
Kentaro SHIBAHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/05/01
Vol. E85-C  No. 5 ; pp. 1091-1097
Type of Manuscript:  INVITED PAPER (Special Issue on Advanced Sub-0.1 µm CMOS Devices)
Category: 
Keyword: 
shallow junctionantimonydopant lossdopant pile-upsheet resistance
 Summary | Full Text:PDF(714.3KB)