Keyword : scaling merit


Realistic Scaling Scenario for Sub-100 nm Embedded SRAM Based on 3-Dimensional Interconnect Simulation
Yasumasa TSUKAMOTO Tatsuya KUNIKIYO Koji NII Hiroshi MAKINO Shuhei IWADE Kiyoshi ISHIKAWA Yasuo INOUE Norihiko KOTANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C  No. 3 ; pp. 439-446
Type of Manuscript:  Special Section PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category: 
Keyword: 
embedded SRAMscaling merit3-dimensional interconnect simulation50 and 70 nm technology nodes
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