Keyword : process simulator

Design and Development of 3-Dimensional Process Simulator
Tetsunori WADA Norihiko KOTANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6 ; pp. 839-847
Type of Manuscript:  INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
semiconductor, process simulator, design, file format, 
 Summary | Full Text:PDF(1.8MB)
3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications
Masato FUJINAGO Tatsuya KUNIKIYO Tetsuya UCHIDA Eiji TSUKUDA Kenichiro SONODA Katsumi EIKYU Kiyoshi ISHIKAWA Tadashi NISHIMURA Satoru KAWAZU 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6 ; pp. 848-861
Type of Manuscript:  Special Section PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
LSI fabrication, process simulator, topography, impurity diffusion, segregation, capacitance, 
 Summary | Full Text:PDF(1.2MB)