Keyword : pre-epi clean

Novel High-Throughput Plasma Enhanced Growth of SiGe in a 200 mm/300 mm Single Wafer Cluster Tool
Juergen RAMM Hans von KANEL 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/10/01
Vol. E86-C  No. 10 ; pp. 1935-1942
Type of Manuscript:  INVITED PAPER (Special Issue on Heterostructure Microelectronics with TWHM2003)
epitaxyvirtual substratestrained siliconlow temperaturepre-epi cleanplasma
 Summary | Full Text:PDF