Keyword : point-defects


3-Dimensional Process Simulation of Thermal Annealing of Low Dose Implanted Dopants in Silicon
Vincent SENEZ Jerome HERBAUX Thomas HOFFMANN Evelyne LAMPIN 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/08/25
Vol. E83-C  No. 8 ; pp. 1267-1274
Type of Manuscript:  Special Section PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Process Modeling and Simulation
Keyword: 
diffusionfinite elementthree-dimensionalgear schemepoint-defectssilicon
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