Keyword : phosphorus


Evaluation of Two-Dimensional Transient Enhanced Diffusion of Phosphorus during Shallow Junction Formation
Hisako SATO Katsumi TSUNENO Hiroo MASUDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2 ; pp. 106-111
Type of Manuscript:  Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category: Process Simulation
Keyword: 
transient enhanced diffusiontwo-dimensionphosphorussiliconshallow junctionfurnace annealing
 Summary | Full Text:PDF(517.8KB)

TiN as a Phosphorus Outdiffusion Barrier Layer for WSix/Doped-Polysilicon Structures
John M. DRYNAN Hiromitsu HADA Takemitsu KUNIO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 613-625
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
barrieroutdiffusionphosphoruspolysilicontitanium nitridetungsten silicide
 Summary | Full Text:PDF(1.2MB)

Diffusion of Phosphorus in Poly/Single Crystalline Silicon
Hideaki FUJIWARA Hideharu NAGASAWA Atsuhiro NISHIDA Koji SUZUKI Kazunobu MAMENO Kiyoshi YONEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 995-1000
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
ion implantationphosphorusdiffusionpolycrystalline silicon
 Summary | Full Text:PDF(594.9KB)