Keyword : pattern fluctuation PMMA


Material Representations and Algorithms for Nanometer Lithography Simulation
Edward W. SCHECKLER Taro OGAWA Shoji SHUKURI Eiji TAKEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2 ; pp. 98-105
Type of Manuscript:  Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category: Process Simulation
Keyword: 
lithography simulationpattern fluctuation PMMASAL-601electron beam
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