Keyword : pattern defect


Sizes and Numbers of Particles Being Capable of Causing Pattern Defects in Semiconductor Device Manufacturing
Mototaka KAMOSHIDA Hirotomo INUI Toshiyuki OHTA Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 264-271
Type of Manuscript:  INVITED PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: 
Keyword: 
semiconductor device manufacturingparticlesizenumberpattern defect
 Summary | Full Text:PDF

Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning
Nobuyoshi HATTORI Masahiko IKENO Hitoshi NAGATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 277-281
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: CIM/CAM
Keyword: 
yield predictionpattern defectphotolithographysemiconducter manufacturing
 Summary | Full Text:PDF