Keyword : oxygen

Study on Surface Characteristic of the Copper Nitride Films by Absorbed Oxygen
Musun KWAK Jongho JEON Kyoungri KIM Yoonseon YI Sangjin AN Donsik CHOI Youngseok CHOI Kyongdeuk JEONG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2012/11/01
Vol. E95-C  No. 11 ; pp. 1744-1748
Type of Manuscript:  INVITED PAPER (Special Section on Electronic Displays)
copper nitrideweak boundary layeroxygenatmospheric pressure plasmaexcimer ultravioletXPSAFM
 Summary | Full Text:PDF(2.3MB)

SIMOX Wafers Having Low Dislocation Density Formed with a Substoichiometric Dose of Oxygen
Sadao NAKASHIMA Katsutoshi IZUMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/12/25
Vol. E75-C  No. 12 ; pp. 1415-1420
Type of Manuscript:  Special Section PAPER (Special Issue on SOI (Si on Insulator) Devices)
Category: SOI Wafers
 Summary | Full Text:PDF(804.4KB)