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| Keyword : oxidation
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Characterization of AlON Thin Films Formed by ECR Plasma Oxidation of AlN/Si(100)
Shun-ichiro OHMI Go YAMANAKA Tetsushi SAKAI | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2004/01/01
Vol. E87-C
No. 1 ;
pp. 24-29
Type of Manuscript:
Special Section PAPER (Special Section on High-κ Gate Dielectrics)
Category:
Keyword:
high-κ, AlON, ECR, sputtering, oxidation, | | | Summary | Full Text:PDF | |
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TCAD--Yesterday, Today and Tomorrow
Robert W. DUTTON | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C
No. 6 ;
pp. 791-799
Type of Manuscript:
INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category:
Keyword:
TCAD, device simulation, process simulation, IC technology, diffusion, ion implantation, oxidation, MOS scaling, modeling, hierarchy, atomic-scale phenomena, | | | Summary | Full Text:PDF | |
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High-Quality Low-Dose SIMOX Wafers
Sadao NAKASHIMA | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1997/03/25
Vol. E80-C
No. 3 ;
pp. 364-369
Type of Manuscript:
INVITED PAPER (Special Issue on SOI Devices and Their Process Technologies)
Category: Wafer Technologies
Keyword:
SOI, SIMOX, annealing, oxidation, Si, | | | Summary | Full Text:PDF | |
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