Keyword : native oxide


Native Oxide Removal from InAlN Surfaces by Hydrofluoric Acid Based Treatment
Takuma NAKANO Masamichi AKAZAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2013/05/01
Vol. E96-C  No. 5 ; pp. 686-689
Type of Manuscript:  BRIEF PAPER
Category: 
Keyword: 
InAlNXPSsurface treatmentHFnative oxide
 Summary | Full Text:PDF(384.8KB)

The Nature of Metallic Contamination on Various Silicon Substrates
Geun-Min CHOI Hiroshi MORITA Jong-Soo KIM Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/10/25
Vol. E82-C  No. 10 ; pp. 1839-1845
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
crystalline siliconamorphous siliconcontamination solutionnative oxidecopper impurity
 Summary | Full Text:PDF(1.5MB)

Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces
Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 375-381
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
ULSIclean surfacenative oxidephoto-excitationhydrogen termination
 Summary | Full Text:PDF(509.5KB)

Chemical Structures of Native Oxides Formed during Wet Chemical Treatments of Silicon Surfaces
Hiroki OGAWA Takeo HATTORI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7 ; pp. 774-780
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
chemical structuresiliconnative oxideH-terminationXPS
 Summary | Full Text:PDF(565.8KB)