Keyword : maskless lithography


Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems
Makoto SUGIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 631-639
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Manufacturing Technology
Keyword: 
maskless lithographycharacter projectionvariable-shaped beammulti-column-cell systemcharacter size optimizationEB shots
 Summary | Full Text:PDF(587.3KB)

Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems
Makoto SUGIHARA Yusuke MATSUNAGA Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2008/12/01
Vol. E91-A  No. 12 ; pp. 3451-3460
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Physical Level Design
Keyword: 
maskless lithographymulti-column-cellscharacter projectionvariable-shaped beamthroughput
 Summary | Full Text:PDF(754.9KB)

Technology Mapping Technique for Increasing Throughput of Character Projection Lithography
Makoto SUGIHARA Kenta NAKAMURA Yusuke MATSUNAGA Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5 ; pp. 1012-1020
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
maskless lithographycharacter projectionvariable-shaped beamtechnology mappingthroughput
 Summary | Full Text:PDF(715.6KB)