Keyword : mask data volume


A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model
Ahmed AWAD Atsushi TAKAHASHI Chikaaki KODAMA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2016/12/01
Vol. E99-A  No. 12 ; pp. 2363-2374
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: 
Keyword: 
pattern fidelityprocess variationmask manufacturabilitymask data volumecomputation time
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