Keyword : lithography


Reflective Three-Layer GH-LC Panel Fabricated by Using Lithographic LC/Resist Composite Films
Naohide WAKITA Yasuhiko YAMANAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/10/25
Vol. E83-C  No. 10 ; pp. 1565-1569
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: 
Keyword: 
liquid crystalsguest hostlithographyphoto-resist
 Summary | Full Text:PDF(4MB)

Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography
Kaichiro NAKANO Katsumi MAEDA Shigeyuki IWASA Etsuo HASEGAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1998/07/25
Vol. E81-C  No. 7 ; pp. 1045-1050
Type of Manuscript:  Special Section PAPER (Special Issue on Organic Materials for Optics and Electronics)
Category: 
Keyword: 
photochemical acid-generatorchemically amplified resistArF excimer laserlithography
 Summary | Full Text:PDF(622.6KB)

Process and Device Technologies for Subhalf-Micron LSI Memory
Katsuhiro TSUKAMOTO Hiroaki MORIMOTO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/08/25
Vol. E77-C  No. 8 ; pp. 1343-1350
Type of Manuscript:  INVITED PAPER (Special Section on High Speed and High Density Multi Functional LSI Memories)
Category: General Technology
Keyword: 
LSI memorylithographyetchingMOS transistordielectric material
 Summary | Full Text:PDF(627.8KB)

High Speed Electron Beam Cell Projection Exposure System
Yoshihiko OKAMOTO Norio SAITOU Haruo YODA Yoshio SAKITANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 445-452
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
cell projectionelectron beamlithographymask processexposure data
 Summary | Full Text:PDF(798.6KB)

New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO Takahiro MATSUO Kazuhiro YAMASHITA Masayuki ENDO Kouji MATSUOKA Taichi KOIZUMI Akiko KATSUYAMA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 416-424
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithographyresistexcimer laseroff-axis illuminationcuring
 Summary | Full Text:PDF(847.3KB)

Quarter Micron KrF Excimer Laser Lithography
Masaru SASAGO Masayuki ENDO Yoshiyuki TANI Satoshi KOBAYASHI Taichi KOIZUMI Takahiro MATSUO Kazuhiro YAMASHITA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 582-587
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithographyresistexcimer laseranti-reflection
 Summary | Full Text:PDF(641KB)

Recent Progress in KrF Excimer Laser Lithography
Makoto NAKASE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 26-31
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
lithographystepperexcimer laserresistsemiconductor device
 Summary | Full Text:PDF(627KB)