Keyword : ion mass analysis


High Rate Sputter-Deposition of TiO2 Films Using Oxide Target
Yoichi HOSHI Tomoki TAKAHASHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/02/01
Vol. E87-C  No. 2 ; pp. 227-231
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering)
Category: 
Keyword: 
TiO2 filmmagnetron sputteringhigh-rate sputteringoxide targetion mass analysis
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