Keyword : high-k


Comparative Analysis of Bandgap-Engineered Pillar Type Flash Memory with HfO2 and S3N4 as Trapping Layer
Sang-Youl LEE Seung-Dong YANG Jae-Sub OH Ho-Jin YUN Kwang-Seok JEONG Yu-Mi KIM Hi-Deok LEE Ga-Won LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2012/05/01
Vol. E95-C  No. 5 ; pp. 831-836
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
SOHOShigh-kgate-all-aroundprogram/erase speedflash memory
 Summary | Full Text:PDF

SONOS-Type Flash Memory with HfO2 Thinner than 4 nm as Trapping Layer Using Atomic Layer Deposition
Jae Sub OH Kwang Il CHOI Young Su KIM Min Ho KANG Myeong Ho SONG Sung Kyu LIM Dong Eun YOO Jeong Gyu PARK Hi Deok LEE Ga Won LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 590-595
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Flash/Advanced Memory
Keyword: 
SONOSSOHOSflash memoryhigh-kHfO2nonvolatile memoryAtomic Layer Deposition
 Summary | Full Text:PDF