Significant Decrease in Thickness of Contaminant Films and Contact Resistance by Humidification Terutaka TAMAITetsushi KAWANO
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1994/10/25 Vol. E77-CNo. 10 ;
pp. 1614-1620 Type of Manuscript: Special Section PAPER (Special Issue on Recent Electromechanical Devices) Category: Contact Reliability Keyword: humidification, film thickness, oxide film, contact resistance, Cu,