Keyword : excimer laser

High-Resolution Beam Profiler for Engineering Laterally-Grown Grain Morphology
Masayuki JYUMONJI Yoshinobu KIMURA Masato HIRAMATSU Yukio TANIGUCHI Masakiyo MATSUMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/11/01
Vol. E86-C  No. 11 ; pp. 2275-2277
Type of Manuscript:  Special Section LETTER (Special Issue on Electronic Displays)
Category: 
Keyword: 
beam profiler, excimer laser, lateral-grain growth, phase-modulated excimer laser crystallization, 
 Summary | Full Text:PDF
Excimer-Laser-Induced Zone-Melting-Recrystallization of Silicon Thin Films on Large Glass Substrates and Its Application to TFTs
Hiromichi TAKAOKA Yoshinobu SATOU Takaomi SUZUKI Takuya SASAKI Hiroshi TANABE Hiroshi HAYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/11/01
Vol. E85-C  No. 11 ; pp. 1860-1865
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: Active Matrix Displays
Keyword: 
excimer laser, crystallization, poly-Si, grain, lateral growth, TFT, 
 Summary | Full Text:PDF
New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO Takahiro MATSUO Kazuhiro YAMASHITA Masayuki ENDO Kouji MATSUOKA Taichi KOIZUMI Akiko KATSUYAMA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 416-424
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, off-axis illumination, curing, 
 Summary | Full Text:PDF
Quarter Micron KrF Excimer Laser Lithography
Masaru SASAGO Masayuki ENDO Yoshiyuki TANI Satoshi KOBAYASHI Taichi KOIZUMI Takahiro MATSUO Kazuhiro YAMASHITA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 582-587
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, anti-reflection, 
 Summary | Full Text:PDF
Recent Progress in KrF Excimer Laser Lithography
Makoto NAKASE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 26-31
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
lithography, stepper, excimer laser, resist, semiconductor device, 
 Summary | Full Text:PDF
Application of Photoexcited Reaction to VLSI Process
Yasuhiro HORIIKE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 32-40
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
photoexcited reaction, VLSI process, excimer laser, laser melt, photochemical, 
 Summary | Full Text:PDF