Keyword : electron beam direct writing (EBDW)

LSI Design Flow for Shot Reduction of Character Projection Electron Beam Direct Writing Using Combined Cell Stencil
Taisuke KAZAMA Makoto IKEDA Kunihiro ASADA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2006/12/01
Vol. E89-A  No. 12 ; pp. 3546-3550
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Physical Design
Keyword: 
character projection (CP), electron beam direct writing (EBDW), combined cell stencil (CCS), placement & routing, 
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