Keyword : dry etching


Dry Etching Technologies of Optical Device and III-V Compound Semiconductors
Ryuichiro KAMIMURA Kanji FURUTA 
Publication:   
Publication Date: 2017/02/01
Vol. E100-C  No. 2 ; pp. 150-155
Type of Manuscript:  INVITED PAPER (Special Section on Fabrication Technologies Supporting the Photonic/Nanostructure Devices)
Category: 
Keyword: 
optical deviceIII-V compound semiconductordry etchingLDLEDglass
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Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices
Masashi NAKAO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2016/03/01
Vol. E99-C  No. 3 ; pp. 333-338
Type of Manuscript:  INVITED PAPER (Special Section on Progress towards System Nanotechnology)
Category: 
Keyword: 
UV-imprint lithographyPDMSLN filterdry etchingsapphire substratealumina nanohole
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Improvement of Etching Selectivity to Photoresist for Al Dry Etching by Using Ion Implantation
Keiichi UEDA Kiyoshi SHIBATA Kazunobu MAMENO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 382-384
Type of Manuscript:  Special Section LETTER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
Photoresistion implantationdry etchingresist selectivity
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N-InAlAs/InGaAs HEMT DCFL Inverter Fabricated Using Pt-Based Gate and Photochemical Dry Etching
Naoki HARADA Shigeru KURODA Kohki HIKOSAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/10/25
Vol. E75-C  No. 10 ; pp. 1165-1171
Type of Manuscript:  Special Section PAPER (Special Issue on Compound Semiconductor Integrated Circuits)
Category: 
Keyword: 
HEMTInGaAsSchottky junctionDCELdry etching
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