Keyword : dry cleaning

Electrical Characteristics of Silicon Devices after UV-Excited Dry Cleaning
Yasuhisa SATO Rinshi SUGINO Masaki OKUNO Toshiro NAKANISHI Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 41-46
Type of Manuscript:  Special Section PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
dry cleaning, dielectric breakdown, Fowler-Nordheim leakage current, junction leakage current, metal contamination, 
 Summary | Full Text:PDF(582.2KB)
Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning
Rinshi SUGINO Yoshiko OKUI Masaki OKUNO Mayumi SHIGENO Yasuhisa SATO Akira OHSAWA Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7 ; pp. 829-833
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
dry cleaning, iron and aluminum, silicon surface, chlorine radical, atomic absorption spectrophotometry, 
 Summary | Full Text:PDF(502.9KB)