Keyword : depth of focus


Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern
Keiichiro TOUNAI Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 425-431
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
KrF excimer steppermodified illuminationdepth of focussimulation
 Summary | Full Text:PDF

Sub-Half Micron Exposure System with Optimized Illumination
Akiyoshi SUZUKI Miyoko NOGUCHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 13-18
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
photolithographyresolutiondepth of focusilluminationquadrupole illumination
 Summary | Full Text:PDF

Phase-Shifting Technology for ULSI Patterning
Tsuneo TERASAWA Shinji OKAZAKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 19-25
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
optical lithographyultralarge scale integration devicesphase shift maskresolutiondepth of focusstepper
 Summary | Full Text:PDF