Keyword : crystallization


Single-Grain Si Thin-Film Transistors for Monolithic 3D-ICs and Flexible Electronics
Ryoichi ISHIHARA Jin ZHANG Miki TRIFUNOVIC Jaber DERAKHSHANDEH Negin GOLSHANI Daniel M. R. TAJARI MOFRAD Tao CHEN Kees BEENAKKER Tatsuya SHIMODA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2014/04/01
Vol. E97-C  No. 4 ; pp. 227-237
Type of Manuscript:  INVITED PAPER (Special Section on Solid-State Circuit Design,---,Architecture, Circuit, Device and Design Methodology)
Category: 
Keyword: 
siliconthin-film transistor3D-ICsexcimer-lasercrystallizationSRAMimage sensorflexible electronics
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Grain Boundary Segregation of Non-magnetic Phases during Crystallization of Co-Based Glasses
Tae Young BYUN Yoong OH Chong Seung YOON Chang Kyung KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/09/01
Vol. E86-C  No. 9 ; pp. 1830-1834
Type of Manuscript:  Special Section PAPER (Special Issue on Recent Progress of High-Density Disk Storage)
Category: 
Keyword: 
segregationnon-magnetic phasecrystallizationamorphous alloy
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Excimer-Laser-Induced Zone-Melting-Recrystallization of Silicon Thin Films on Large Glass Substrates and Its Application to TFTs
Hiromichi TAKAOKA Yoshinobu SATOU Takaomi SUZUKI Takuya SASAKI Hiroshi TANABE Hiroshi HAYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/11/01
Vol. E85-C  No. 11 ; pp. 1860-1865
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: Active Matrix Displays
Keyword: 
excimer lasercrystallizationpoly-Sigrainlateral growthTFT
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Crystallization of Amorphous YBCO and BSCCO Thin Films by Zone-Melt Technique
Katsuro OKUYAMA Shigetoshi OHSHIMA Hiroaki UENISHI Shiro KAMBE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/08/25
Vol. E76-C  No. 8 ; pp. 1241-1245
Type of Manuscript:  Special Section PAPER (Special Issue on High-Temperature Superconducting Electronics)
Category: 
Keyword: 
YBCO filmsBSCCO filmscrystallizationzonemelt technique
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High Speed Crystallization of a-Si by Lateral Sweep Annealing in Steep Temperature Gradient
Akio KITAGAWA Masaki TAKEUCHI Sadaki FUTAGI Syungo KANAI Kazunori TUBOTA Yasuhiro KIZU Masakuni SUZUKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 1031-1035
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
SIO structurecrystallizationpoly-Si filmgas flame annealingsolid phase epitaxy
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