Keyword : chemically amplified resist

Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography
Kaichiro NAKANO Katsumi MAEDA Shigeyuki IWASA Etsuo HASEGAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1998/07/25
Vol. E81-C  No. 7 ; pp. 1045-1050
Type of Manuscript:  Special Section PAPER (Special Issue on Organic Materials for Optics and Electronics)
photochemical acid-generatorchemically amplified resistArF excimer laserlithography
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