Keyword : chemical vapor deposition


Synthesis of Single- and Double-Wall Carbon Nanotubes by Gas Flow-Modified Catalyst-Supported Chemical Vapor Deposition
Naoki KISHI Toshiki SUGAI Hisanori SHINOHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2009/12/01
Vol. E92-C  No. 12 ; pp. 1483-1486
Type of Manuscript:  BRIEF PAPER
Category: Nanomaterials and Nanostructures
Keyword: 
carbon nanotubeschemical vapor depositionraman spectroscopytransmission electron microscopy
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Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics
Kenichiro NAKAMATSU Masao NAGASE Toshinari ICHIHASHI Kazuhiro KANDA Yuichi HARUYAMA Takashi KAITO Shinji MATSUI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/01/01
Vol. E90-C  No. 1 ; pp. 41-45
Type of Manuscript:  Special Section PAPER (Special Section on Microoptomechatronics)
Category: Micro/Nano Fabrication
Keyword: 
nanospringdiamond-like carbonfocused ion beamchemical vapor depositionmechanical characteristics
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Fabrication of Coplanar Microstructures Composed of Multiple Organosilane Self-Assembled Monolayers
Hiroyuki SUGIMURA Atsushi HOZUMI Osamu TAKAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/07/25
Vol. E83-C  No. 7 ; pp. 1099-1103
Type of Manuscript:  Special Section PAPER (Special Issue on Organic Molecular Electronics for the 21st Century)
Category: Ultra Thin Film
Keyword: 
photolithographyorganosilane self-assembled monolayerchemical vapor depositionscanning probe microscopeexcimer lamp
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Equipment Simulation of Production Reactors for Silicon Device Fabrication
Christoph WERNER 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6 ; pp. 992-996
Type of Manuscript:  INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
equipment simulationCVD reactorchemical vapor depositionTCADcomputer modelingcomputational fluid dynamicssilicon devicesVLSI
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Effects of Post-Annealing on Dielectric Properties of (Ba, Sr)TiO3 Thin Films Prepared by Liquid Source Chemical Vapor Deposition
Tsuyoshi HORIKAWA Junji TANIMURA Takaaki KAWAHARA Mikio YAMAMUKA Masayoshi TARUTANI Kouichi ONO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1998/04/25
Vol. E81-C  No. 4 ; pp. 497-504
Type of Manuscript:  Special Section PAPER (Special Issue on Advanced Memory Devices Using High-Dielectric-Constant and Ferroelectric Thin Films)
Category: 
Keyword: 
chemical vapor deposition(Ba,Sr)TiO3annealingdielectric constantdielectric breakdown
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Synchrotron Radiation Induced Direct Projection Patterning of Aluminum on Si and SiO2 Surfaces
Fumihiko UESUGI Iwao NISHIYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 47-54
Type of Manuscript:  Special Section PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
synchrotron radiationsurface modificationaluminumchemical vapor depositionreaction controlgrowth suppressiongrowth initiationchemical shift
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