Chemical Structures of Native Oxides Formed during Wet Chemical Treatments of Silicon Surfaces Hiroki OGAWATakeo HATTORI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/07/25 Vol. E75-CNo. 7 ;
pp. 774-780 Type of Manuscript: Special Section PAPER (Special Issue on Ultra Clean Technology) Category: Keyword: chemical structure, silicon, native oxide, H-termination, XPS,