Keyword : charge-to-breakdown


Thickness Dependence of Furnace N2O-Oxynitridation Effects on Breakdown of Thermal Oxides
Toshimasa MATSUOKA Shigenari TAGUCHI Kenji TANIGUCHI Chihiro HAMAGUCHI Seizo KAKIMOTO Junkou TAKAGI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/03/25
Vol. E78-C  No. 3 ; pp. 248-254
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-1/4 Micron Device and Process Technologies)
Category: 
Keyword: 
N2O-oxynitridationcharge-to-breakdownthin dielectricsMOS structuredielectric reliability
 Summary | Full Text:PDF

Plasma-Induced Transconductance Degradation of nMOSFET with Thin Gate Oxide
Koji ERIGUCHI Masatoshi ARAI Yukiharu URAOKA Masafumi KUBOTA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/03/25
Vol. E78-C  No. 3 ; pp. 261-266
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-1/4 Micron Device and Process Technologies)
Category: 
Keyword: 
MOSFETtransconductanceSi-SiO2 interface statecharge-to-breakdownantenna effect
 Summary | Full Text:PDF