Keyword : character projection


High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters
Rimon IKENO Takashi MARUYAMA Satoshi KOMATSU Tetsuya IIZUKA Makoto IKEDA Kunihiro ASADA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2013/12/01
Vol. E96-A  No. 12 ; pp. 2458-2466
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Physical Level Design
Keyword: 
electron beam direct writingcharacter projectionVIAinterconnectrouting
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Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems
Makoto SUGIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 631-639
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Manufacturing Technology
Keyword: 
maskless lithographycharacter projectionvariable-shaped beammulti-column-cell systemcharacter size optimizationEB shots
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Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems
Makoto SUGIHARA Yusuke MATSUNAGA Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2008/12/01
Vol. E91-A  No. 12 ; pp. 3451-3460
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Physical Level Design
Keyword: 
maskless lithographymulti-column-cellscharacter projectionvariable-shaped beamthroughput
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Technology Mapping Technique for Increasing Throughput of Character Projection Lithography
Makoto SUGIHARA Kenta NAKAMURA Yusuke MATSUNAGA Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5 ; pp. 1012-1020
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
maskless lithographycharacter projectionvariable-shaped beamtechnology mappingthroughput
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Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
Makoto SUGIHARA Taiga TAKATA Kenta NAKAMURA Ryoichi INANAMI Hiroaki HAYASHI Katsumi KISHIMOTO Tetsuya HASEBE Yukihiro KAWANO Yusuke MATSUNAGA Kazuaki MURAKAMI Katsuya OKUMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2006/03/01
Vol. E89-C  No. 3 ; pp. 377-383
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era)
Category: CAD
Keyword: 
cell librarycharacter projectionelectron beamEB shotsthroughputoptimizationinteger linear programming
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