Keyword : channel stop


Half-Micron LOCOS Isolation Using High Energy Ion Implantation
Koji SUZUKI Kazunobu MAMENO Hideharu NAGASAWA Atsuhiro NISHIDA Hideaki FUJIWARA Kiyoshi YONEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 972-977
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
ion implantationLOCOSisolationchannel stopITF
 Summary | Full Text:PDF(519.5KB)