Keyword : boron


Multiscale Simulation of Diffusion, Deactivation and Segregation of Boron in Silicon
Wolfgang WINDL 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C  No. 3 ; pp. 269-275
Type of Manuscript:  INVITED PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category: 
Keyword: 
ab-initioborondiffusiondeactivationsegregation
 Summary | Full Text:PDF(836.7KB)

Evaluation of the Point Defect Bulk Recombination Rate by Ion Implantation at High Temperatures
Peter PICHLER Rainer SCHORK Thomas KLAUSER Heiner RYSSEL 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/02/25
Vol. E75-C  No. 2 ; pp. 128-137
Type of Manuscript:  Special Section PAPER (Special Issue on Selected Papers from '91 VPAD)
Category: 
Keyword: 
boronantimonydiffusionpoint defectsimplantation enhancement
 Summary | Full Text:PDF(750.4KB)