Keyword : atomic layer deposition


Room Temperature Atomic Layer Deposition of Nano Crystalline ZnO and Its Application for Flexible Electronics
Kazuki YOSHIDA Kentaro SAITO Keito SOGAI Masanori MIURA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   
Publication Date: 2021/07/01
Vol. E104-C  No. 7 ; pp. 363-369
Type of Manuscript:  PAPER
Category: Electronic Materials
Keyword: 
room temperature processatomic layer depositioncrystallizationZnO
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Interaction of Bis-diethylaminosilane with a Hydroxylized Si (001) Surface for SiO2 Thin-Film Growth Using Density Functional Theory
Seung-Bin BAEK Dae-Hee KIM Yeong-Cheol KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/05/01
Vol. E94-C  No. 5 ; pp. 771-774
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
atomic layer depositionBis-diethylaminosilanedensity functional theorySiO2
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Effect of Purge Time on the Properties of HfO2 Films Prepared by Atomic Layer Deposition
Takaaki KAWAHARA Kazuyoshi TORII 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/01/01
Vol. E87-C  No. 1 ; pp. 2-8
Type of Manuscript:  Special Section PAPER (Special Section on High-κ Gate Dielectrics)
Category: 
Keyword: 
CMOSFEThigh-κ gate dielectricHfO2atomic layer depositionlong purgeimpuritygate leakage current
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