Keyword : X-ray lithography


Fabrication of Integrated PTFE-Filled Waveguide Butler Matrix for Short Millimeter-Wave by SR Direct Etching
Mitsuyoshi KISHIHARA Masaya TAKEUCHI Akinobu YAMAGUCHI Yuichi UTSUMI Isao OHTA 
Publication:   
Publication Date: 2018/06/01
Vol. E101-C  No. 6 ; pp. 416-422
Type of Manuscript:  PAPER
Category: Microwaves, Millimeter-Waves
Keyword: 
microstructureX-ray lithographydielectric loaded waveguidesButler matrixmillimeter wave circuits
 Summary | Full Text:PDF(1.2MB)

Design and Fabrication of PTFE-Filled Waveguide Components by SR Direct Etching
Mitsuyoshi KISHIHARA Hiroaki IKEUCHI Yuichi UTSUMI Tadashi KAWAI Isao OHTA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2012/01/01
Vol. E95-C  No. 1 ; pp. 122-129
Type of Manuscript:  PAPER
Category: Microwaves, Millimeter-Waves
Keyword: 
X-ray lithographybandpass filtersdirectional couplerssputteringdielectric materials
 Summary | Full Text:PDF(2.3MB)

An Ultra-Deep High-Q Microwave Cavity Resonator Fabricated Using Deep X-Ray Lithography
Zhen MA David M. KLYMYSHYN Sven ACHENBACH Martin BORNER Nina DAMBROWSKY Jurgen MOHR 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/12/01
Vol. E90-C  No. 12 ; pp. 2192-2197
Type of Manuscript:  Special Section PAPER (Special Section on Recent Technologies for Microwave and Millimeter-wave Passive Devices)
Category: 
Keyword: 
cavity resonatorsmicromachiningRF MEMSX-ray lithographyhigh Q
 Summary | Full Text:PDF(706KB)

A 0.25-µm BiCMOS Technology Using SOR X-Ray Lithography
Shinsuke KONAKA Hakaru KYURAGI Toshio KOBAYASHI Kimiyoshi DEGUCHI Eiichi YAMAMOTO Shigehisa OHKI Yousuke YAMAMOTO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 355-361
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
BiCMOSX-ray lithographySORself-aligned bipolarmetallization
 Summary | Full Text:PDF(959.8KB)

The Analysis of Waveguiding Effects on the Minimum Transferable Linewidth of an Ultrafine X-Ray Mask
Masaki TAKAKUWA Kazuhito FURUYA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 594-599
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
quantum size structureX-ray lithographyminimum transferable linewidthelectron wave devices
 Summary | Full Text:PDF(388.4KB)