| Keyword : ULSI
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Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces Takashi ITO | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C
No. 3 ;
pp. 375-381
Type of Manuscript:
Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing Keyword: ULSI, clean surface, native oxide, photo-excitation, hydrogen termination, | | Summary | Full Text:PDF(509.5KB) | |
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