Keyword : TiSi

Highly Sensitive OBIRCH System for Fault Localization and Defect Detection
Kiyoshi NIKAWA Shoji INOUE 
Publication:   IEICE TRANSACTIONS on Information and Systems
Publication Date: 1998/07/25
Vol. E81-D  No. 7 ; pp. 743-748
Type of Manuscript:  Special Section PAPER (Special Issue on Test and Diagnosis of VLSI)
Category: Beam Testing/Diagnosis
VLSI chipfault localizationmetal line defect detectionhigh resistivityTiSiAlreliabilityyieldfailure analysis
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