Keyword : SiO2


Interaction of Bis-diethylaminosilane with a Hydroxylized Si (001) Surface for SiO2 Thin-Film Growth Using Density Functional Theory
Seung-Bin BAEK Dae-Hee KIM Yeong-Cheol KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/05/01
Vol. E94-C  No. 5 ; pp. 771-774
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
atomic layer depositionBis-diethylaminosilanedensity functional theorySiO2
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Physical Origin of Stress-Induced Leakage Currents in Ultra-Thin Silicon Dioxide Films
Tetsuo ENDOH Kazuyuki HIROSE Kenji SHIRAISHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5 ; pp. 955-961
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Ultra-Thin Gate Insulators
Keyword: 
SILCstress-induced leakage currentSiO2ultra thin silicon dioxidemean-free-pathO vacancy model
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Influence of Silicone Vapor on Micro-Motor Reliability
Terutaka TAMAI Kiyoshi OGAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/06/01
Vol. E86-C  No. 6 ; pp. 885-890
Type of Manuscript:  Special Section PAPER (Special Issue on Recent Development of Electro-Mechanical Devices (IS-EMD 2002))
Category: Contact Phenomena
Keyword: 
silicone vapormicro-motorcontaminationreliabilitySiO2
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Improvements of Crystal Orientations of Wurtzite-Type GaN Thin Films Grown on Metal Surfaces
Yuichi SATO Toshifumi HISHINUMA Susumu SATO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/06/01
Vol. E86-C  No. 6 ; pp. 1002-1006
Type of Manuscript:  Special Section PAPER (Special Issue on Recent Development of Electro-Mechanical Devices (IS-EMD 2002))
Category: Emerging Technologies
Keyword: 
wurtzite structureGaNmetal-foilintermediate layerSiO2
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Low-Temperature Gate Insulator for Poly-Si Thin Film Transistors by Combination of Photo-Oxidation and Plasma Enhanced Chemical Vapor Deposition Using Tetraethylorthosilicate and O2 Gases
Yukihiko NAKATA Tetsuya OKAMOTO Toshimasa HAMADA Takashi ITOGA Yutaka ISHII 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/11/01
Vol. E85-C  No. 11 ; pp. 1849-1853
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: Active Matrix Displays
Keyword: 
oxidationpoly-SiTFTgate insulatorSiO2
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Visible Electroluminescence from MOS Capacitors with Si-Implanted SiO2
Toshihiro MATSUDA Masaharu KAWABE Hideyuki IWATA Takashi OHZONE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/11/01
Vol. E85-C  No. 11 ; pp. 1895-1904
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: EL Displays
Keyword: 
MOS capacitorelectroluminescenceSi-implantationSiO2
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Adsorption of Silicone Vapor on the Contact Surface and Its Effect on Contact Failure of Micro Relays
Terutaka TAMAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/09/25
Vol. E83-C  No. 9 ; pp. 1402-1408
Type of Manuscript:  Special Section PAPER (Special Issue on Current Electromechanical Devices and Their Materials with Recent Innovations)
Category: 
Keyword: 
silicone contaminationcontact resistanceadsorbed silicone moleculeswitching rateSiO2
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Peculiar Patterns of SiO2 Contamination on the Contact Surface of a Micro Relay Operated in a Silicone Vapor Environment
Terutaka TAMAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/01/25
Vol. E82-C  No. 1 ; pp. 81-85
Type of Manuscript:  Special Section LETTER (Special Issue on Electromechanical Devices and Their Materials)
Category: 
Keyword: 
electric contactsilicone contaminationSiO2contact failurecontamination pattern
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A Novel Electron Beam Resist System Convertible into Silicate Glass
Toshio ITO Miwa SAKATA Maki KOSUGE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 588-593
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
electron beam resistglasspoly (siloxane)SiO2O2-RIE
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Deposition of High-Quality Silicon Dioxide by Remote Plasma CVD Technique
Takashi FUYUKI Takeshi FURUKAWA Tohru OKA Hiroyuki MATSUNAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 1013-1018
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
remote plasma CVDSiO2
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The Effect of Chemical Cleaning on Bulk Traps in Dry Gate Oxide
Hidetsugu UCHIDA Norio HIRASHITA Tsuneo AJIOKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7 ; pp. 790-795
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
hole trapelectron trapchemical cleaningSiO2avalanche injection
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