Keyword : SiO2 film


High-Rate Oblique Deposition of SiO2 Films Using Two Sputtering Sources
Yoichi HOSHI Kensuke YAGI Eisuke SUZUKI Hao LEI Akira SAKAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10 ; pp. 1644-1648
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
oblique depositionSiO2 filmreactive sputteringhigh-rate depositionalignment layer
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