Keyword : SiF4/SiH4/H2 gas flow rates


Effect of SiF4/SiH4/H2 Flow Rates on Film Properties of Low-Temperature Polycrystalline Silicon Films Prepared by Plasma Enhanced Chemical Vapor Deposition
Mikio MOHRI Hiroaki KAKINUMA Taiji TSURUOKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/10/25
Vol. E77-C  No. 10 ; pp. 1677-1684
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
low-temperature poly-Si filmsSiF4/SiH4/H2 gas flow rateselectrical propertyX-ray diffractionRaman spectra
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