Keyword : Ni-silicide


Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology
Soon-Young OH Jang-Gn YUN Bin-Feng HUANG Yong-Jin KIM Hee-Hwan JI Sang-Bum HUH Han-Seob CHA Ui-Sik KIM Jin-Suk WANG Hi-Deok LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4 ; pp. 651-655
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Si Devices and Processes
Keyword: 
Ni-silicidebi-layer cappingternary phasenano-scale MOSFET
 Summary | Full Text:PDF

Effects of Electric Field on Metal-Induced Lateral Crystallization under Limited Ni-Supply Condition
Gou NAKAGAWA Noritoshi SHIBATA Tanemasa ASANO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4 ; pp. 662-666
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Thin Film Transistors
Keyword: 
poly-SiTFTmetal-induced lateral crystallizationneedle-like SiNi-silicideelectric field
 Summary | Full Text:PDF