Keyword : H-termination


Initial Stage of SiO2/Si Interface Formation on Si(111) Surface
Hiroshi NOHIRA Yoshinari TAMURA Hiroki OGAWA Takeo HATTORI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7 ; pp. 757-763
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
oxidationsiliconH-terminationXPS
 Summary | Full Text:PDF

Chemical Structures of Native Oxides Formed during Wet Chemical Treatments of Silicon Surfaces
Hiroki OGAWA Takeo HATTORI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7 ; pp. 774-780
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
chemical structuresiliconnative oxideH-terminationXPS
 Summary | Full Text:PDF