IEICE Trans

Yoichi HOSHI

High-Rate Oblique Deposition of SiO₂ Films Using Two Sputtering Sources Yoichi HOSHI Kensuke YAGI Eisuke SUZUKI Hao LEI Akira SAKAI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2008/10/01 Vol. E91-C No. 10 pp. 1644-1648 Type of Manuscript: Special Section PAPER (Special Section on Functional Thin Films for Optical Applications) Category: Keyword: oblique deposition, SiO₂ film, reactive sputtering, high-rate deposition, alignment layer,
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Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer Hao LEI Keisuke ICHIKAWA Meihan WANG Yoichi HOSHI Takayuki UCHIDA Yutaka SAWADA
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2008/10/01 Vol. E91-C No. 10 pp. 1658-1662 Type of Manuscript: Special Section PAPER (Special Section on Functional Thin Films for Optical Applications) Category: Keyword: facing-target sputtering, indium tin oxide, low damage, organic layer, shield, γ-electrons,
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High Rate Sputter-Deposition of TiO₂ Films Using Oxide Target Yoichi HOSHI Tomoki TAKAHASHI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2004/02/01 Vol. E87-C No. 2 pp. 227-231 Type of Manuscript: Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering) Category: Keyword: TiO₂ film, magnetron sputtering, high-rate sputtering, oxide target, ion mass analysis,
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FOREWORD Yoichi HOSHI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2004/02/01 Vol. E87-C No. 2 pp. 188-188 Type of Manuscript: FOREWORD Category: Keyword:
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Low Temperature Deposition of Indium Tin Oxide Thin Films by Low Voltage Sputtering in Various Rare Gases Yoichi HOSHI Hidehiko SHIMIZU
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2004/02/01 Vol. E87-C No. 2 pp. 212-217 Type of Manuscript: Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering) Category: Keyword: ITO, low voltage sputtering, Kr gas sputtering, Xe gas sputtering, low temperature deposition,
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